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AssigneeThe United States of America as represented by the Secretary of the Air Force
InventorsJoseph D. Lichtenhan, Timothy S. Haddad, Frank J. Feher, Daravong Soulivong
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Method is provided for selectively opening rings of polyhedral oligomeric silsesquioxane (POSS) compounds to from functionalized derivatives thereof or new POSS species. Per the inventive method, the POSS compound is reacted with an acid to selectively cleave bonds in the POSS rings to add functionalities thereto for grafting, polymerization or catalysis, to thus form new familes of POSS derived compounds. Also provided are the new compounds so formed. Method is also provided for expanding rings of POSS compounds. Per the inventive method, a POSS compound is reacted with silane reagents to obtain an expanded POSS framework with added Si ring substituends to form new families of POSS compounds. Also provided are the new compounds so formed.
A method for selectively opening rings in polyhedral oligomeric silsesquioxane (POSS) compounds to form functionalized derivatives comprising, reacting [(RSiO1.5)n]Σ# with an acid to form POSS species beating one or more functionalities suitable for polymerization, grafting or catalysis, where R is aliphatic, aromatic, olefinic, alkoxy, siloxy or H, n is 4-24, # is n and said acid is HBF4/BF3, CF3SO3H, ClSO3H, CH3SO3H, H2SO4, HClO4, HCl, HBr, HI, HF or combinations thereof.
A method for selectively opening the rings in POSS compounds to form functionalized POSS derivatives comprising, reacting [(RSiO1.5)n]Σ# with a strong acid to form [(RSiO1.5)n−m(RXSiO1.0)m]Σ#, where n is 4-24, m is 1-10# is m+n, R is selected from the group consisting of aliphatic, aromatic, olefinic, alkoxy, siloxy and H and X is the conjugate base of said acids, which base is F, OH, SH, NHR, NR2, ClO4, SO3CH3, SO3CF3, SO3OH, SO3Cl, SO3CH3, NO3, PO4 or Cl.
A method for selectively opening the rings in POSS compounds to form functionalized POSS derivatives comprising, reacting [(RSiO1.5)nΣ#, (RSiO1.5)n(R3SiO1.5)m]Σ# or [(RSiO1.5)n(R1R2SiO1.0)m]Σ# with a strong acid to from said derivatives, having a conjugate base X, which base is F, OH, SH, NHR NR2, ClO4, SO3CH3SO3CF3, SO3OH, SO3Cl, SO3CH3, NO3, PO4 or Cl, where n is 6-12, m is 1-10, where R1, R2 and R3 are different substituents than R which are all selected from the group consisting of aliphatic, aromatic, olefinic, alkoxy, siloxy and H and where # is the sum of the lettered substituents in said POSS compound.
A polyhedral oligomeric silsesquioxane (POSS) compound of the formula [(RSiO1.5)n(RXSiO1.0)m]Σ#, where n is 4-24, m is 1-10, R is aliphatic, aromatic, olefine, alkoxy, siloxy or H and X is the conjugate base of an acid, which base is of F, OH, where the OH groups are in an exo-stereochemical position, SH, NHR or NR2, ClO4, SO3OH, SO3CF3, SO3Cl, SO3CH3, NO3 or PO4.
A method for expanding rings in polyhedral oligomeric silsesquioxane (POSS) compounds comprising, reacting endo-[(RSiO1.5)n(R(HO)SiO1.0)m]Σ# with Y2SiR1R2 silane reagents to obtain at least one expanded POSS ring in [(RSiO1.5)n+m(R1R2SiO1.0)j]Σ#, where R, R1 and R2 are aliphatic, aromatic, olefinic, alkoxy, siloxy or H, Y is halide or amine, n is 4-24, m is 1-10 and j is 1-10 and # is the sum of the lettered subtituents in said respective POSS compound.
A composition having at least one expanded ring in polyhedral oligomeric silsesquioxane (POSS) of the formula [(RSiO1.5)n(R1R2SiO1.0)j]Σ#, where R, R1 and R2 are aliphatic, aromatic, olefinic, alkoxy, siloxy or H, n is 4-24, j is 1-10 and is n+j.
Dependencies are inferred from the claim text.