Method for fabricating waveguides
AssigneeApplied Materials, Inc.
InventorsDan Maydan, Arkadii V. Samoilov
Life of this patent
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Abstract
A method of forming a planar waveguide structure, comprising forming a first graded layer on a substrate, wherein the first graded layer comprises a first and a second optical material, wherein the concentration of the first optical material increases with the height of the first graded layer; forming a second graded layer on the first graded layer, the second graded layer comprising the first and second optical materials wherein the concentration of the first optical material decreases with the height of the second graded layer. The method further including forming a uniform layer on the first graded layer, the uniform layer containing first and second optical materials wherein the first optical material concentration is constant.
Claims29
A method of forming a planar waveguide structure, comprising:
- forming a first graded layer on a substrate, the first graded layer comprising silicon and germanium wherein the germanium concentration increases with the height of the first graded layer;
- and
- forming a second graded layer immediately over the first graded layer, the second graded layer comprising silicon and germanium wherein the germanium concentration decreases with the height of the second graded layer.
A computer readable medium comprising executable program instructions that when executed cause a digital processing system to perform a method comprising:
- forming a first graded layer on a substrate, the first graded layer comprising silicon and germanium wherein the germanium concentration increases with the height of the first graded layer;
- and
- forming a second graded layer immediately over the first graded layer, the second graded layer comprising silicon and germanium wherein the germanium concentration decreases with the height of the second graded layer.
A method of forming a planar waveguide structure, comprising:
- forming a first graded layer on a substrate, wherein the first graded layer comprises a first and a second optical material, wherein the concentration of the first optical material and the index of refraction of the first graded layer increases with the height of the first graded layer;
- and
- forming a second graded layer immediately over the first graded layer, the second graded layer comprising the first and second optical materials wherein the concentration of the first optical material and the index of refraction of the second layer decreases with the height of the second graded layer.
Dependencies are inferred from the claim text.