Adjusting a sampling rate based on state estimation results
AssigneeAdvanced Micro Devices, Inc.
InventorsJin Wang, Brian K. Cusson
Life of this patent
Estimating the term…
Abstract
A method and an apparatus are provided for adjusting a sampling rate based on a state estimation result. The method comprises receiving metrology data associated with processing of workpieces, estimating a next process state based on at least a portion of the metrology data and determining an error value associated with the estimated next process state. The method further comprises processing a plurality of workpieces based on the estimated next process state and adjusting a sampling protocol of the processed workpieces that are to be measured based on the determined error value.
Claims28
A method, comprising:
- receiving metrology data associated with one or more previously processed workpieces;
- estimating a next process state based on at least a portion of the metrology data;
- determining an error value associated with the estimated next process state;
- processing a plurality of workpieces based on the estimated next process state;
- and
- adjusting a sampling protocol of the processed workpieces that are to be measured based on the determined error value.
An apparatus, comprising:
- an interface adapted to receive metrology data associated with processing of workpieces;
- and
- a control unit communicatively coupled to the interface, the control unit adapted to:
- estimate a next process state based on at least a portion of the metrology data;
- determine an error value associated with the estimated next process state;
- process a plurality of workpieces based on the estimated next process state;
- and
- adjust a sampling protocol of the processed workpieces that are to be measured based on the determined error value.
An apparatus, comprising:
- means for receiving metrology data associated with processing of workpieces;
- means for estimating a next process state based on at least a portion of the metrology data;
- means for determining an error value associated with the estimated next process state;
- means for processing a plurality of workpieces based on the estimated next process state;
- and
- means for adjusting a sampling protocol of the processed workpieces that are to be measured based on the determined error value.
An article comprising one or more machine-readable storage media containing instructions that when executed enable a processor to:
- receive metrology data associated with processing of workpieces;
- estimate a next process state based on at least a portion of the metrology data;
- determine an error value associated with the metrology data;
- process a plurality of workpieces based on the estimated next process state;
- and
- adjust a number of the processed workpieces that are to be measured based on the determined error value.
A system, comprising:
- a controller adapted to:
- eceive metrology data associated with processing of workpieces;
- estimate a next process state based on at least a portion of the metrology data;
- determine an error value associated with the estimated next process state;
- and
- a processing tool to process a plurality of workpieces based on the estimated next process state, and
- wherein the controller is adapted to adjust a number of the processed workpieces that are to be measured based on the determined error value.
Dependencies are inferred from the claim text.