Lithographic apparatus, device manufacturing method, and device manufactured thereby
AssigneeASML Netherlands B.V.
InventorsAntonius Johannes Josephus Van Dijsseldonk, Erik Roeloff Loopstra, Dominicus Jacobus Petrus Adrianus Franken
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Abstract
A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.
Claims26
A lithographic projection apparatus comprising:
- a radiation system to provide a projection beam of radiation;
- a support structure to support patterning structure adapted to pattern the projection beam according to a desired pattern;
- a substrate table to hold a substrate;
- a projection system to project the patterned beam onto a target portion of the substrate;
- and
- an active reflector comprising
- a body member,
- a reflective multilayer, and
- at least one actuator controllable to adjust a surface figure of said reflective multilayer,
- wherein said actuator is operable to exert a force having a component in a direction parallel to the surface figure of said reflective multilayer and comprises an element of at least one of the radiation system and the projection system.
A device manufacturing method comprising:
- projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material on a substrate;
- and
- controlling an active reflector to minimize wavefront aberration in the patterned beam of radiation, wherein said active reflector comprises a body member, a reflective multilayer and at least one actuator controllable to adjust a surface figure of said reflecting multiplayer by exerting a force having a component in a direction parallel to a surface figure of the reflective multilayer and wherein said active reflector comprises an element of at least one of a radiation system to produce the beam of radiation and a projection system to project the patterned beam of radiation.
Dependencies are inferred from the claim text.