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AssigneeHitachi High-Technologies Corporation
InventorsIsao Ochiai, Toshiei Kurosaki, Toshiro Kubo, Naomasa Suzuki
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An electron microscope including an apparatus for x-ray analysis, is capable of performing elemental analysis with X-rays emitted from a specimen by electron beam irradiation, that is, inspection of foreign particles, for enhancement of yields in manufacturing, at high speed and with high precision and high space resolving power. The current quantity of the electron beam is automatically controlled such that an X-ray count rate falls within a range of 1000 to 2000 counts per second, a plurality of X-ray energy regions are set up when checking an X-ray spectrum against reference spectra stored in a database for analysis of the X-ray spectrum, matching is performed for each of the X-ray energy regions, and the distribution of the elements observed is analyzed on the basis of an intensity ratio between X-ray sample spectra obtained by electron beam irradiation at not less than two varied acceleration voltages.
An electron microscope having an electron beam optical system provided with an electron source and a lens for focusing an electron beam, an optical system controller for controlling the electron beam optical system, a specimen stage on which a specimen is to be placed, an electron detector for detecting electrons emitted from the specimen by irradiating the specimen with the electron beam, an X-ray detector for detecting X rays radiated from the specimen, and a processor for processing signals from both the detectors, and performing image formation and elemental analysis of the specimens, said electron microscope comprising:
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