Back to results
US 6,764,212 B1Granted
Chemical supply system
AssigneeSipec Corporation
InventorsTakahisa Nitta, Nobuhiro Miki, Yoshiaki Yamaguchi
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
AssigneeSipec Corporation
InventorsTakahisa Nitta, Nobuhiro Miki, Yoshiaki Yamaguchi
Estimating the term…
A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply apparatus connected to the chemical storage tank for positively performing chemical supply, a piping system connected to the chemical supply apparatus to form a supply flow passage that is a passage for ultrapure water which the liquid chemical is to be mixed with, a pair of discharge nozzles disposed at end portions of the piping system so as to oppose surfaces of a wafer set in a cleaning chamber to supply a cleaning liquid onto the surfaces. Thereby, remarkable miniaturization/simplification of a cleaning liquid supply system including chemical tanks is intended, it is made possible easily and rapidly to compound and supply a cleaning liquid at an accurate chemical concentration, and particles or the like being generated and mixing in a cleaning liquid, are suppressed to the extremity.
A chemical supply system for supplying a mixture solution to a chemical treatment chamber, wherein said mixture solution includes a liquid chemical mixed and diluted with a solvent, said chemical supply system comprising:
Dependencies are inferred from the claim text.