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US 6,762,802 B2Granted
Liquid crystal display device and fabrication method thereof
AssigneeRenesas Technology Corp.
InventorsKikuo Ono, Yoshiaki Nakayoshi, Ryutaro Oke, Toshiki Kaneko
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Abstract
The present invention provides a novel photolithography processes using photoresist pattern having at least two areas which has different thickness from each other for a fabrication method for a liquid crystal display device having reversed staggered and channel-etched type thin film transistors, reduce a number of photolithography processes required for whole of the fabrication process of the liquid crystal display device, and improve brightness of the liquid crystal display device.
Claims4
A liquid crystal display device comprising:
- a first insulating substrate and a second insulating substrate disposed to be opposite to the first insulating substrate;
- a liquid crystal layer being interposed between the first insulating substrate and the second insulating substrate;
- charges-holding capacitance sections, each of which has an upper electrode, a dielectric film and a lower electrode,
- wherein said dielectric film is formed between said lower electrode and the upper electrode at each of said charges-holding capacitance sections, and said upper electrode contacts with said dielectric film through a contact hole provided by perforating a protective film formed over said dielectric film, and a semiconductor layer provided between said protective film and said dielectric film is selectively etched to be only around said contact hole.
1 more element
Dependencies are inferred from the claim text.