US 6,759,275 B1 · Method for making high-performance RF integrated circuits

Abstract

A new method and structure is provided for the creation of a semiconductor inductor. Under the first embodiment of the invention, a semiconductor substrate is provided with a scribe line in a passive surface region and active circuits surrounding the passive region. At least one bond pad is created on the passive surface of the substrate close to and on each side of the scribe line. A layer of insulation is deposited, a layer of dielectric is deposited over the layer of insulation, at least one bond pad is provided on the surface of the layer of dielectric on each side of the scribe line. At least one inductor is created on each side of the scribe line on the surface of the layer of dielectric. A layer of passivation is deposited over the layer of dielectric. The substrate is attached to a glass panel by interfacing the surface of the layer of passivation with the glass panel. The substrate is sawed from the backside of the substrate in alignment with the scribe line. The silicon that remains in place in the passive surface of the substrate underneath the scribe lines is removed by etching, the glass panel is separated along the scribe line. Under the second embodiment of the invention, the inductor is created on the surface of a thick layer of polymer that is deposited over the layer of passivation.

Claims11

Dependent claims

A method for fabricating a planar inductor in high-performance high-frequency semiconductor circuits, comprising the steps of:

providing a substrate having a top side and a bottom side wherein said top side has a passive surface and an active surface, wherein active devices with conductive interconnects are created over said active surface of said substrate;
creating at least one pair of planar inductors overlying said passive surface of said substrate;
providing a passivation layer over said passive surface and said active surface of said substrate and overlying said at least one pair of planar inductors;
forming a scribe line penetrating through said passivation layer overlying said passive surface to said passive surface and separating said at least one pair of planar inductors;
attaching a glass panel to said layer of passivation;
cutting said substrate from said bottom side, said cutting being aligned with said passive surface of said substrate, said cutting not completely penetrating through said substrate;
thereafter removing from said bottom side all of said substrate material underlying said passive surface of said substrate, exposing at least one first bond pad created on said passive surface on each side of said scribe line;
and
cutting said glass panel in alignment with said scribe line.

6 more elements

A method for fabricating a planar inductor in a semiconductor circuit comprising:

providing a substrate having a top side and a bottom side wherein said top side of said substrate contains active regions separated by a passive region wherein active devices are formed in said active region on said top side of said substrate wherein at least one pair of first bond pads is formed on said substrate surface in said passive region, wherein a dielectric layer is formed overlying said active devices in said active regions and overlying said at least one pair of first bond pads in said passive region, wherein at least one pair of second bond pads is formed in a top portion of said dielectric layer in said passive region, wherein a passivation layer is formed overlying said dielectric layer, and wherein a scribe line is formed through said passivation layer and said dielectric layer to said substrate in said passive region wherein said scribe line separates each of said pairs of first bond pads and second bond pads;
attaching a glass panel to said passivation layer;
cutting said substrate from said bottom side in alignment with said scribe line wherein said cutting does not completely penetrate through said substrate;
thereafter removing all of said substrate from said bottom side in said passive region thereby exposing said at least one pair of first bond pads from said bottom side;
and
thereafter dicing said substrate along said scribe line.

3 more elements

A method for fabricating a planar inductor in a semiconductor circuit comprising:

providing a substrate having a top side and a bottom side wherein said top side of said substrate contains active regions separated by a passive region wherein active devices are formed in said active region on said top side of said substrate wherein at least one pair of first bond pads is formed on said substrate surface in said passive region, wherein a dielectric layer is formed overlying said active devices in said active regions and overlying said at least one pair of first bond pads in said passive region, wherein at least one pair of second bond pads is formed in a top portion of said dielectric layer in said passive region, wherein at least one pair of planar inductors are formed overlying said dielectric layer in said passive region, wherein a passivation layer is formed overlying said dielectric layer, and wherein a scribe line is formed through said passivation layer and said dielectric layer to said substrate in said passive region wherein said scribe line separates each of said pairs of first bond pads, second bond pads, and inductors;
attaching a glass panel to said passivation layer;
cutting said substrate from said bottom side in alignment with said scribe line wherein said cutting does not completely penetrate through said substrate;
thereafter removing all of said substrate from said bottom side in said passive region thereby exposing said at least one pair of first bond pads from said bottom side;
and
thereafter dicing said substrate along said scribe line.

3 more elements

Dependencies are inferred from the claim text.

Method for making high-performance RF integrated circuits

Life of this patent

Method for making high-performance RF integrated circuits

Life of this patent

Abstract

Claims11