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US 6,759,261 B2Granted
Thin film-structure and a method for producing the same
AssigneeTokyo Institute of Technology
InventorsAkira Shimokohbe, Seiichi Hata
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Abstract
A thin film made of an amorphous material having supercooled liquid phase region is formed on a substrate. Then, the thin film is heated to a temperature within the supercooled liquid phase region and is deformed by its weight, mechanical external force, electrostatic external force or the like, thereby to form a thin film-structure. Thereafter, the thin film-structure is cooled down to room temperature, which results in the prevention of the thin film's deformation.
Claims16
A method for producing a thin film-structure comprising the steps of:
- forming on a substrate a thin film made of an amorphous material film exhibiting a viscous flow within a range 1011-1013 Pa·S when heated at a temperature within a supercooled liquid phase region;
- heating the thin film to a temperature within the supercooled liquid phase region so that the thin film has a viscous flow between 1011-1013 Pa·S at a glass-transition temperature;
- deforming the thin film to a given shape without the use of an external force;
- and
- cooling the thin film to room temperature from the temperature within the supercooled liquid phase region to stop deforming the thin film and thereby forming the thin film-structure.
2 more elements
Dependencies are inferred from the claim text.