Nano-imprinting method, magnetic printing method and recording medium
AssigneeKabushiki Kaisha Toshiba
InventorsMasatoshi Sakurai, Katsuyuki Naito
Life of this patent
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Abstract
A nano-imprinting method includes a process of transferring an embossed pattern from a master plate (120) to a surface of a pattern-receiving or donee substrate (130) by applying a pressure to the master plate (120) having an information carrier region (120A) having formed the embossed pattern and the donee substrate (139) from opposite sides of a pair of press surfaces (100) sandwiching them. When the pressure is applied, a buffer layer (110) shaped in accordance with the information carrier region is interposed in a position aligned with a pattern-forming region between the master plate or donee substrate and the press surface.
Claims9
A nano-imprinting method for transferring an embossed pattern from a master plate having the embossed pattern to a pattern-receiving surface of a pattern-receiving element, comprising:
- preparing the master plate having an information carrier region on which the embossed pattern is formed, and a substantially flat information-free region;
- preparing the pattern-receiving element having the pattern-receiving surface which has a size corresponding to the information carrier region plus at least a part of the information-free region;
- preparing a buffer layer which is smaller than the master plate and the pattern-receiving surface and has a shape corresponding to the information carrier region;
- and
- applying a pressure to the master plate and the pattern-receiving element by a pair of press surfaces holding the master plate, the pattern-receiving element and the buffer layer.
A nano-imprinting method for transferring an embossed pattern from a master plate having the embossed pattern to a pattern-receiving surface of a pattern-receiving element in form of a substantially cylindrical drum having the pattern-receiving surface on a side surface thereof, comprising:
- preparing the master plate having an information carrier region on which the embossed pattern is formed, and a substantially flat information-free region;
- preparing the pattern-receiving element having the pattern-receiving surface which has a size corresponding to the information carrier region plus at least a part of the information-free region;
- preparing a buffer layer which is smaller than the master plate and the pattern-receiving surface and has a shape corresponding to the information carrier region;
- and
- pressing and rolling the pattern-receiving element over the master plate which is placed on a press surface via the buffer layer.
Dependencies are inferred from the claim text.