Lithographic apparatus, device manufacturing method, and device manufactured thereby

A device manufacturing method using a lithographic projection apparatus comprising:

• providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
• providing a projection beam of radiation;
• patterning the projection beam of radiation with a pattern in its cross-section;
• projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material, and
• supporting along a support direction one of a support structure of the lithographic projection apparatus, a substrate table of the lithographic projection apparatus and an isolated reference frame of the lithographic projection apparatus with a support member a direction that is substantially perpendicular to the support direction of the support member,
• wherein said support member comprises:
• a gas-filled pressure chamber, the gas in the pressure chamber acting on a movable member such as to at least partially counteract a force substantially parallel to the support direction, and
• a gas evacuating structure constructed and arranged to evacuate gas escaping towards the vacuum chamber through a gap between the movable member and a bearing surface.