Method for the manufacture of a liquid crystal display
OwnerHong-Da Liuinventor
Life of this patent
Estimating the term…
Abstract
The method uses one photomask and one-exposure steps wherein said photomask comprising two major portions that are formed by mirror image with each other, the wides of openings formed in said photomask being increased from a central portion to an edge portion, the spaces between two adjacent said openings being decreased from said central portion to said edge. Then, shift said substrate with a distance to a direction perpendicular to a surface of said photomask. Next, expose said photosensitive material layer by using said photomask; and developing the photosensitive material to form said bump structure.
Claims12
A method of forming a bump structure, said method comprising:
- (a) using a light to pass through a photomask to expose a photosensitive material layer deposited on the surface of a substrate, wherein said photomask comprising two major portions that are formed by mirror image with each other, the wides of openings formed in said photomask being increased from a central portion to an edge portion, the spaces between two adjacent said openings being decreased from said central portion to said edge, and a diffraction situation being generated when said light passing through said photomask;
- (b) shifting said substrate with a distance to a direction perpendicular to a surface of said photomask;
- (c) exposing said photosensitive material layer by using said photomask;
- and
- (d) developing the photosensitive material to form said bump structure.
A method of forming a liquid crystal display, said method comprising:
- providing a pair of light polarizers;
- forming a compensator on one of said pair of light polarizers;
- forming a pair of transparent insulating substrate on said compensator and on other one of said pair of light polarizers;
- forming bump structures on at least one of said pair of transparent insulating substrate by following steps:
- (a) using a light to pass through a photomask to expose a photosensitive material layer deposited on the surface of a substrate, wherein said photomask comprising two major portions that are formed by mirror image with each other, the wides of openings formed in said photomask being increased from a central portion to an edge portion, the spaces between two adjacent said openings being decreased from said central portion to said edge, and a diffraction situation being generated when said light passing through said photomask;
- (b) shifting said substrate with a distance to a direction perpendicular to a surface of said photomask;
- (c) exposing said photosensitive material layer by using said photomask;
- and
- (d) developing the photosensitive material to form said bump structure,
- forming orientation layers over said pair of transparent insulating substrate and over said bump structures;
- and
- providing liquid crystal molecules between said pair of transparent insulating substrate.
Dependencies are inferred from the claim text.