Lithographic apparatus, device manufacturing method, and device manufactured thereby

A lithographic projection apparatus configured and arranged to image a pattern onto a substrate that is at least partially covered by a layer of radiation-sensitive material, said apparatus comprising:

• a radiation system configured and arranged to provide a projection beam of radiation;
• a support structure configured and arranged to support a patterning structure, the patterning structure serving to produce a desired pattern in the projection beam;
• a substrate table configured and arranged to hold the substrate;
• a projection system configured and arranged to project the patterned projection beam onto a target portion of the substrate;
• an image sensing device configured end arranged to measure a pattern in the patterned projection beam, said image sensing device including:
• a slab;
• at least one radiation-sensitive sensor arranged on a first side of the slab, said at least one sensor being an integral part of said slab and being sensitive to the radiation of the projection beam;
• and
• a film of a material that is non-transparent to the radiation of the projection beam, said film being provided on the first side of the slab over said at least one sensor and having a patterned segment above each sensor configured and arranged to selectively pass radiation of the projection beam to said sensor;
• and
• an intermediate plate made from a material having a thermal expansion coefficient below approximately 12×10−6K−1,
• wherein said slab is mounted with a surface opposite to the first side facing a slab-bearing surface of the intermediate plate.