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US 6,747,245 B2Granted
Laser scanning apparatus and methods for thermal processing
AssigneeUltratech Stepper, Inc.
InventorsSomit Talwar, Michael O. Thompson, David A. Markle
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Abstract
Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.
Claims43
An apparatus to thermally process a region of a substrate, comprising along an axis:
- a continuous radiation source capable of providing a continuous first radiation beam with a first intensity profile and a wavelength capable of heating the region of the substrate;
- an optical system adapted to receive the first radiation beam and form a second radiation beam therefrom that forms an image at the substrate;
- and
- a stage adapted to support the substrate;
- wherein at least one of the optical system and the stage is adapted to scan the image with respect to the substrate in a scan direction to heat the region with a pulse of radiation to a temperature sufficient to thermally process the region.
2 more elements
Dependencies are inferred from the claim text.