Method of correcting non-linearity of metrology tools, and system for performing same
AssigneeAdvanced Micro Devices, Inc.
InventorsJames Broc Stirton, Kevin R. Lensing
Life of this patent
Estimating the term…
Abstract
The present invention is generally directed to various methods of correcting non-linearity in metrology tools, and a system for performing same. In one illustrative embodiment, the method comprises creating a non-linear model of measurement data produced by a metrology tool when measuring a plurality of features, each of which has a different, known feature size, measuring a production feature using the metrology tool to produce metrology data for the production feature, determining a correction factor to be applied to the metrology data for the production feature by comparing the non-linear model to a linear model, and applying the determined correction factor to the metrology data for the production feature.
Claims41
A method of using a metrology tool, comprising:
- creating a non-linear model of measurement data produced by said metrology tool when measuring a plurality of features, each of which has a different, known feature size;
- measuring a production feature using said metrology tool to produce metrology data for said production feature;
- determining a correction factor to be applied to said metrology data for said production feature by comparing said non-linear model to a linear model;
- and
- applying said determined correction factor to said metrology data for said production feature.
A method of using a metrology tool, comprising:
- creating a non-linear model of measurement data produced by said metrology tool when measuring a plurality of features, each of which has a different, known feature size;
- measuring a production feature formed above a semiconducting substrate using said metrology tool to produce metrology data for said production feature;
- providing said metrology data for said production feature to a controller that determines a correction factor to be applied to said metrology data for said production feature by comparing said non-linear model to a linear model;
- and
- applying said determined correction factor to said metrology data for said production feature.
A method of using a scanning electron microscope, comprising:
- creating a non-linear model of measurement data produced by said scanning electron microscope when measuring a plurality of features, each of which has a different, known feature size;
- measuring a production feature using said scanning electron microscope to produce metrology data for said production feature;
- providing said metrology data for said production feature to a controller that determines a correction factor to be applied to said metrology data for said production feature by comparing said non-linear model to a linear model;
- and
- applying said determined correction factor to said metrology data for said production feature.
A method of using a metrology tool, comprising:
- creating a non-linear model of measurement data produced by said metrology tool when measuring a plurality of gate electrode features, each of which has a different, known feature size;
- measuring a production gate electrode feature formed above a semiconducting substrate using said metrology tool to produce metrology data for said production gate electrode feature;
- determining a correction factor to be applied to said metrology data for said production gate electrode feature by comparing said non-linear model to a linear model;
- and
- applying said determined correction factor to said metrology data for said production gate electrode feature.
Dependencies are inferred from the claim text.