Photosensitive resin composition
AssigneeFuji Photo Film Co., Ltd.
InventorsNoriaki Watanabe, Koichi Kawamura, Kazuo Fujita, Takeshi Serikawa, Akira Nagashima
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Abstract
A photosensitive resin composition containing a high molecular compound having at least a) a fluoro aliphatic group, and b) a group represented by formula —L—P (wherein L represents a divalent organic group connected to the skeleton of the high molecular compound, and P represents an aromatic group having a carboxyl group at the ortho-position).
Claims3
A photosensitive resin composition containing a high molecular compound having at least a) a fluoro aliphatic group, and b) a group represented by formula LP (wherein L represents a divalent organic group connected to the skeleton of the high molecular compound, and P represents an aromatic group having a carboxyl group at the ortho-position).
A photosensitive lithographic printing plate comprising a support having coated thereon a photosensitive layer containing the following components (a), (b) and (c),
- (a) an o-naphthoquinonediazide compound,
- (b) a resin soluble in an alkaline aqueous solution, and
- (c) a polymer having a (meth)acrylate monomer having two or three perfluoroalkyl groups having from 3 to 20 carbon atoms in the molecule as a polymer component.
Dependencies are inferred from the claim text.