US 6,746,714 B2Granted

Porous silica coating with low dielectric constant, semiconductor device and coating composition

AssigneeClariant Finance (BVI) Limited

InventorsTomoko Aoki, Yasuo Shimizu

Life of this patent

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Abstract

A coating composition having an aluminum-containing polysilazane and a polyacrylate or polymethacrylate ester in an organic solvent and methods of producing the same.

Claims8

Dependent claims

A method of producing a porous silica coating having a dielectric constant of less than 2.5, characterized by firing a coating of a composition comprising an aluminum-containing polysilazane and either polyacrylate ester or polymethacrylate ester.

Dependencies are inferred from the claim text.

Facts

Application: 10/370,588Filed 24 Feb 2003 · division
Priority: JP 11-19928213 Jul 1999
Published: US 2003/0099843 A114 Aug 2003
Granted: 8 Jun 2004
Term ends: Not estimatedThe source records don’t support an estimate.

Classification9 codes

C09D 183/16
Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing…:…
H10P 14/6529
Of treatments performed after formation of the materials: by exposure to a gas or vapour
H10P 14/6689
The compound comprising silicon and nitrogen: the compound being a silazane
H10P 14/69215
Containing silicon: the material being a silicon oxide, e.g. SiO2

Family

PCT/JP00/04021Parent of this division · filed 20 Jun 2000
US 2003/0152783 A1Pre-grant publication · published 14 Aug 2003
Application10/009,735Parent of this division
US 2003/0099843 A1Published application
US 6,746,714 B2This patent

From the US filing history. Foreign family members aren’t listed.

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