Method for manufacture of a solar cell
AssigneeRWE Schott Solar, Inc.
InventorsThomas Lauinger, Ingo Schwirtlich, Jens Moschner
Life of this patent
Estimating the term…
Abstract
The invention relates to a method for manufacture of a semiconductor component by the formation of a hydrogenous layer containing silicon on a substrate comprising or containing silicon such as a wafer or film. In order to achieve a good surface and volume passivation, it is proposed that during formation of the siliceous layer in the form of SiNxOy with 0<x≦1.5 and 0≦y≦2 one or more catalytically acting dopants are selectively added into the layer which release hydrogen from the SiNxOy layer. The concentration C of the dopants is 1×1014 cm3≦C≦1021 cm3.
Claims34
A method for manufacture of a solar cell comprising a hydrogenous layer containing silicon in the form of a passivation and/or anti-reflection layer on a substrate comprising silicon,
- comprising forming the hydrogenous layer containing silicon with a formula SiNxOy with 0<x≦1.5 and 0≦y≦2, and selectively adding into the layer at least one catalytically acting dopant with a concentration C of 1×1014 cm−3≦C≦1021 cm−3.
Dependencies are inferred from the claim text.