Back to results
US 6,745,484 B2Granted
Reticle, and pattern positional accuracy measurement device and method
AssigneeFujitsu Limited
InventorsTsutomu Horie, Kazutoshi Ohta
Life of this patent
Estimating the term…
Abstract
A positional accuracy measurement pattern is formed such that the position of an edge portion required to have high positional accuracy in a device pattern and the position of the pattern center of the positional accuracy measurement pattern are arranged on the same straight line in accordance with a direction in which the high positional accuracy is necessary. On the basis of the pattern center of the positional accuracy measurement pattern and the difference between the measurement value and the design value of the pattern dimension, the positional accuracy (the difference between the measurement value and the design value) of an edge portion of the device pattern is calculated.
Claims15
A reticle comprising:
- a plurality of device patterns formed in a plurality of arrangements in a device region, the device patterns being arranged in directions in which high positional accuracy is required in each device pattern;
- and
- a positional accuracy measurement pattern used to evaluate the positional accuracy of the device patterns, the positional accuracy measurement pattern being formed for each arrangement of the device patterns,
- wherein the positional accuracy measurement pattern is formed with a central position of the positional accuracy measurement pattern and a position of a portion required to have high positional accuracy in the device patterns being on a same straight line perpendicular to a direction in which the high positional accuracy is required.
1 more element
A pattern positional accuracy measurement device comprising:
- a plurality of device patterns formed in a plurality of arrangements on a reticle, the device patterns being arranged in directions in which high positional accuracy is required in each device pattern;
- a measurement pattern used to evaluate the positional accuracy of the device patterns, the measurement pattern being formed for each arrangement of the device patterns, wherein a design central position of the measurement pattern and a design position of a portion required to have high positional accuracy in the device patterns are on a same straight line perpendicular to a direction in which the high positional accuracy is required;
- a positional information detector detecting actual positional information of the measurement pattern;
- an arithmetic unit calculating an actual central position of the measurement pattern and an actual measurement pattern dimension of the measurement pattern based upon the actual positional information detected by said positional information detector, and calculating positional accuracy of the portion required to have high positional accuracy in the device patterns formed on the reticle based upon the calculated measurement pattern central position and calculated measurement pattern dimension and the design measurement pattern central position and a design measurement pattern dimension;
- and
- an output unit outputting the positional accuracy calculated by said arithmetic unit.
3 more elements
A pattern positional accuracy measurement method comprising:
- forming a plurality of device patterns in a plurality of arrangements on a reticle, the device patterns being arranged in directions in which high positional accuracy is required in each device pattern;
- forming a measurement pattern, used to evaluate the positional accuracy of the device patterns, for each arrangement of the device patterns, wherein a design central position of the measurement pattern and a design position of a portion required to have high positional accuracy in the device patterns are on a same straight line perpendicular to a direction in which the high positional accuracy is required;
- detecting actual positional information of the measurement pattern;
- calculating an actual central position of the measurement pattern and an actual measurement pattern dimension of the measurement pattern based upon the actual detected positional information;
- calculating positional accuracy of the portion required to have high positional accuracy in the device patterns formed on the reticle based upon the calculated measurement pattern central position and calculated measurement pattern dimension and the design measurement pattern central position and a design measurement pattern dimension;
- and
- outputting the calculated positional accuracy.
4 more elements
A pattern positional accuracy measurement method comprising:
- forming a plurality of device patterns in a plurality of arrangements on a reticle, the device patterns being arranged in directions in which high positional accuracy is required in each device pattern;
- forming a measurement pattern, used to evaluate the positional accuracy of the device patterns, for each arrangement of the device patterns;
- inputting design values of a pattern dimension and a central position of the measurement pattern formed on the reticle and a design value of a position of a portion required to have high positional accuracy in the device patterns, wherein the design values of the central position of the measurement pattern and the position of the portion required to have high positional accuracy in the device patterns are on a same straight line perpendicular to a direction in which the high positional accuracy is required;
- detecting positional information of the measurement pattern;
- calculating an actual measurement pattern central position and an actual measurement pattern dimension of the measurement pattern based upon the detected positional information;
- comparing the calculated measurement pattern dimension with the input design value of the measurement pattern dimension;
- calculating positional accuracy of the portion required to have high positional accuracy in the device patterns based upon a result of said comparing and the calculated measurement pattern central position;
- and
- outputting the calculated positional accuracy.
6 more elements
Dependencies are inferred from the claim text.