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US 6,743,564 B2Granted
Amine compounds, resist compositions and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Tomohiro Kobayashi, Takeru Watanabe
Life of this patent
Estimating the term…
Abstract
Amine compounds having a cyano group are useful in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.
Claims27
A resist composition comprising a basic compound having a cyano group, said basic compound selected from amine compounds of formulae (1), (2), (3) and (4):
- wherein R1 is independently a straight or branched alkylene group of 1 to 4 carbon atoms,
- R2 is independently hydrogen or a straight, branched or cyclic alkyl group of 1 to 20 carbon atoms which may contain a hydroxy group, ether group, carbonyl group, ester group, lactone ring, carbonate or cyano group,
- R3 is a straight or branched alkylene group of 2 to 20 carbon atoms which may contain a hydroxy group, ether group, thioether group, carbonyl group, ester group, thioester group or carbonate,
- R4 is independently a straight or branched alkylene group of 1 to 4 carbon atoms,
- “a” is an integer of 1 to 3, and
- a+b=3.
3 more elements
A positive resist composition comprising
- (A) an amine compound selected from compounds of formulae (1), (2), (3) and (4):
- wherein R1 is independently a straight or branched alkylene group of 1 to 4 carbon atoms,
- R2 is independently hydrogen or a straight, branched or cyclic alkyl group of 1 to 20 carbon atoms which may contain a hydroxy group, ether group, carbonyl group, ester group, lactone ring, carbonate or cyano group,
- R3 is a straight or branched alkylene group of 2 to 20 carbon atoms which may contain a hydroxy group, ether group, thioether group, carbonyl group, ester group, thioester group or carbonate,
- R4 is independently a straight or branched alkylene group of 1 to 4 carbon atoms,
- “a” is an integer of 1 to 3, and a+b=3,
- (B) an organic solvent,
- (C) a base resin having an acidic functional group protected with an acid labile group, which is normally alkali insoluble or substantially alkali insoluble, but becomes alkali soluble upon elimination of the acid labile group, and
- (D) a photoacid generator.
6 more elements
A negative resist composition comprising
- (A) an amine compound selected from compounds of formulae (1), (2), (3) and (4):
- wherein R1 is independently a straight or branched alkylene group of 1 to 4 carbon atoms,
- R2 is independently hydrogen or a straight, branched or cyclic alkyl group of 1 to 20 carbon atoms which may contain a hydroxy group, ether group, carbonyl group, ester group, lactone ring, carbonate or cyano group,
- R3 is a straight or branched alkylene group of 2 to 20 carbon atoms which may contain a hydroxy group, ether group, thioether group, carbonyl group, ester group, thioester group or carbonate,
- R4 is independently a straight or branched alkylene group of 1 to 4 carbon atoms,
- “a” is an integer of 1 to 3, and a+b=3,
- (B) an organic solvent,
- (C) a base resin which is normally alkali soluble, but becomes substantially alkali insoluble when crosslinked with a crosslinker,
- (D) a photoacid generator, and
- (F) the crosslinker capable of crosslinking under the action of acid.
7 more elements
An amine compound of the following general formula (1):
- wherein
- R1 is, each independently, a straight or branched alkylene group of 1 to 4 carbon atoms,
- a is an integer of 1 or 2,
- a+b is 3, and
- R2 is a compound of formula (6)
- wherein
- R7 is ethylene,
- R8 is methylene, and
- R9 is, each independently, a hydrogen or a straight, branched or cyclic alkyl group of 1 to 20 carbon atoms which optionally contains a hydroxy group, ether group, ester group, lactone ring or cyano group.
6 more elements
An amine compound of the following general formula (2):
- R1 is a straight or branched alkylene group of 1 to 4 carbon atoms.
Dependencies are inferred from the claim text.