Target and process for its production, and method of forming a film having a high refractive index
AssigneeAsahi Glass Ceramics Co., Ltd.
InventorsOtojiro Kida, Akira Mitsui, Eri Suzuki, Hisashi Osaki, Atsushi Hayashi
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Abstract
A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MOx as the main component, wherein MOx is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
Claims30
A sputtering target comprising a substrate and a target material formed on the substrate, wherein
- the target material comprises as a main component an oxygen deficient oxide;
- and
- the oxygen deficient oxide comprises a metal oxide of a chemical formula TaOx where 2<x<2.5.
A method of making a sputtering target, the method comprising
- forming a target material by plasma spraying a ceramic powder in a semi-molten state in a high temperature plasma gas in a reducing atmosphere onto a substrate, wherein
- the target material comprises as a main component an oxygen deficient oxide;
- and
- the oxygen deficient oxide comprises a metal oxide of a chemical formula TaOx where 2<x<2.5.
A method for forming a film, the method comprising sputtering a target, wherein
- the sputtering target comprises a substrate and a target material formed on the substrate;
- the target material comprises as a main component an oxygen deficient oxide;
- and
- the oxygen deficient oxide comprises a metal oxide of a chemical formula TaOx where 2<x<2.5.
A sputtering target comprising
- a substrate;
- a target material formed on the substrate;
- and
- an undercoat of a metal or alloy between the target material and the substrate, wherein
- the target material comprises as a main component an oxygen deficient oxide;
- and
- the oxygen deficient oxide comprises a metal oxide of a chemical formula TaOx where 2<x<2.5.
The sputtering target according to 16, wherein the undercoat has a thickness of from 30 to 100 μm.
Dependencies are inferred from the claim text.