Substrate treatment process and apparatus
Assigneem[Circlesolid]FSI Ltd.
InventorsKousaku Matsuno, Masao Iga
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Abstract
A substrate treatment process is disclosed to remove organic matter existing on a substrate such as a wafer, glass substrate or ceramic. The process comprises treating the substrate with ozone water and then with hydrogen water, or treating the substrate with ozone-hydrogen water or treating the substrate with ozone water and hydrogen water at the same time.
Claims19
A substrate treatment process for removing organic matter existing on a substrate, comprising treating said substrate with ozone water prepared by dissolving an ozone-containing gas in ultrapure water and hydrogen water prepared by dissolving a hydrogen-containing gas in ultrapure water in tandem, wherein said ozone water includes at least one substance added in the amount, sufficient to maintain ozone concentration in said ozone water, wherein the said substance is selected from the group consisting of carbon dioxide and ammonium carbonate.
Dependencies are inferred from the claim text.