Method and system for manufacturing a photocathode
AssigneeLitton Systems, Inc.
InventorsJames D. Pruet, David G. Couch
Life of this patent
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Abstract
A system (10) for manufacturing a photocathode includes a support (12) and a polishing pad (14) disposed adjacent the support (12). The polishing pad (14) is operable to polish the photocathode in response to movable contact of the photocathode relative to the polishing pad (14). The system (10) also includes a rinsing system (16) coupled to the support (12). The rinsing system (16) is operable to deliver a rinsing agent to the polishing pad (14). The system (10) further includes a control system (62) operable to automatically regulate delivery of the rinsing agent to the rinsing system (16) at a predetermined time period.
Claims13
A system for manufacturing a photocathode comprising:
- a support;
- a polishing pad disposed adjacent the support, the polishing pad operable to polish the photocathode in response to movable contact of the photocathode relative to the polishing pad;
- and
- a rinsing element disposed about a periphery of the polishing pad, the rinsing element operable to retain a polishing compound on the polishing pad during polishing of the photocathode, the rinsing element having a plurality of passages operable to direct a rinsing agent to the portion of the polishing pad.
A system for manufacturing a photocathode comprising:
- a support;
- a polishing pad disposed outwardly from the support, the polishing pad operable to polish the photocathode in response to movable contact of the photocathode relative to the polishing pad;
- and
- a rinsing element disposed about a periphery of the polishing pad, the rinsing element operable to retain a polishing compound on the polishing pad during polishing of the photocathode, the rinsing element further operable to direct a rinsing agent toward the polishing pad in a direction parallel to a top surface of the polishing pad.
A system for manufacturing a photocathode comprising:
- a support;
- a polishing pad disposed adjacent the support, the polishing pad operable to polish the photocathode in response to movable contact of the photocathode relative to the polishing pad;
- a rinsing element rotatably coupled to the support and disposed about a portion of the polishing pad, the rinsing element operable to retain a polishing compound on the polishing pad during polishing of the photocathode, the rinsing element having a plurality of passages operable to direct a rinsing agent to the portion of the polishing pad;
- and
- wherein an axis of rotation of the rinsing element is parallel to a top surface of the polishing pad.
Dependencies are inferred from the claim text.