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US 6,734,029 B2Granted
Method for forming conductive film pattern, and electro-optical device and electronic apparatus
AssigneeSeiko Epson Corporation
InventorMasahiro Furusawa
Life of this patent
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Abstract
A method for forming a high quality conductive film pattern having an accuracy on the order of microns by simple steps is provided. A lyophilic region and a lyophobic region are formed on a predetermined pattern using an organic molecular film on a surface of a substrate, and after a solution dispersed with conductive fine particles is selectively applied to the lyophilic region, the solution applied to the lyophilic region is converted into a conductive film by a heat treatment, and a conductive film is formed on only the lyophilic region.
Claims9
A method for forming a conductive film pattern, comprising the steps of:
- forming a predetermined pattern having a lyophilic region and a lyophobic region using an organic molecular film on a surface of a substrate;
- selectively applying a solution comprising conductive fine particles to the lyophilic region;
- and
- converting the solution applied to the lyophilic region into a conductive film by a heat treatment.
1 more element
Dependencies are inferred from the claim text.