Deposited film forming method and deposited film forming apparatus
AssigneeCanon Kabushiki Kaisha
InventorsAtsushi Yasuno, Hiroshi Izawa, Masatoshi Tanaka
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Abstract
A deposited film forming method and apparatus includes a belt-like member continuously conveyed through a film-forming chamber, one side of which is formed of the belt-like member. A reactive gas is introduced into the film-forming chamber, the interior of the film-forming chamber is evacuated, a high-frequency power induces a plasma therein, and a deposited film is formed on the belt-like member A discharge confining means is provided opposite to a deposited film forming side of the belt-like member to maintain constant contact with the belt-like member while it changes shape.
Claims10
A deposited film forming method of, while continuously conveying a belt-like member in a longitudinal direction thereof, passing the belt-like member through a film-forming chamber, one side of which is formed of the belt-like member and which is located in a vacuum-sealable reaction vessel, introducing a reactive gas into the film-forming chamber, evacuating the interior of the film-forming chamber by evacuation means to maintain the interior of the film-forming chamber at a given pressure, introducing a high-frequency power into the film-forming chamber to induce a plasma, and forming a deposited film on the belt-like member passing through the film-forming chamber,
- wherein on a side opposite to a deposited film forming side of the belt-like member that forms said one side of the film-forming chamber, there is provided discharge confining means always maintaining contact with said opposite side of the belt-like member while following a change in shape of the belt-like member to hermetically close gaps between the opposite side of the belt-like member and the discharge confining means, whereby the deposited film is formed in a state of reduced discharge leakage and sparks in the film-forming chamber.
A deposited film forming apparatus comprising:
- means for continuously conveying a substrate consisting of a belt-like member for formation of a deposited film, in a longitudinal direction thereof;
- a vacuum-sealable reaction vessel having therein a film-forming chamber, one side of which is constituted of the belt-like member;
- means for introducing a reactive gas into the film-forming chamber;
- means for introducing a high-frequency power from a high frequency power supply into the film-forming chamber;
- and means for evacuating the interior of the film-forming chamber,
- wherein on a side opposite to a deposited film-forming side of the belt-like member that forms said one side of the film-forming chamber, there is provided discharge confining means always maintaining contact with said opposite side of the belt-like member while following a change in shape of the belt-like member to hermetically close gaps between the opposite side of the belt-like member and the discharge confining means.
Dependencies are inferred from the claim text.