Method for producing a filled recess in a material layer, and an integrated circuit configuration produced by the method
AssigneeInfineon Technologies AG
InventorsRobert Aigner, Klaus-Günter Oppermann
Life of this patent
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Abstract
A recess is produced in a material layer by creating at least a first and a second structure in various steps. The layers define each other laterally and extend to the bottom of the recess. The first structure and the second structure are so narrow that they can be made by creating conformally produced layers that have an independent thickness and are smaller than the depth of the recess. The conformally produced layers are formed in an appropriate deposition process. A covering structure can be produced on top of the first and second structure. An opening can be made in the covering structure, through which the first structure and the second structure can be removed in an etching step.
Claims4
An integrated circuit configuration, comprising:
- a material layer having a recess and a circular plane having a diameter of a few μm formed therein, said recess having a depth of at least a few μm and a horizontal cross section with a sufficiently large diameter for fitting a said circular plane into said horizontal cross-section;
- and
- a cover structure disposed above and outside said recess for forming at least part of a cavity, said cover structure having a bottom face facing said recess, said bottom face having at least one projection tapering towards said bottom of said recess, said projection being smaller than said depth of said recess.
Dependencies are inferred from the claim text.