Multiple electron beam lithography system with multiple beam modulated laser illumination

A method for generating patterns on a workpiece, comprising:

• generating a light beam;
• splitting said light beam into a plurality of light beams;
• modulating an intensity of said plurality of light beams;
• applying modulated light beams to a photocathode to generate a plurality of electron beams;
• and
• demagnifying said plurality of electron beams in an electron column.

A method, comprising:

• providing a laser for generating a laser beam;
• providing at least one beam splitter for splitting said laser beam into a plurality of beams;
• providing at least one acousto-optical modulator for modulating intensities of said plurality of beams;
• and
• providing a photocathode in a path of said plurality of beams for generating electron beams.