Magnetoresistive device and method of manufacturing same and thin-film magnetic head and method of manufacturing same

A method of manufacturing a magnetoresistive device comprising:

• a magnetoresistive element that detects a magnetic field;
• two electrode layers for feeding a current for detecting the magnetic field to the magnetoresistive element;
• a first shield layer and a second shield layer that sandwich and shield the magnetoresistive element and the electrode layers;
• a first insulating layer disposed between the magnetoresistive element/the electrode layers and the first shield layer;
• and a second insulating layer disposed between the magnetoresistive element/the electrode layers and the second shield layer, the method comprising the steps of:
• forming the first shield layer;
• forming the first insulating layer on the first shield layer;
• forming the magnetoresistive element and the electrode layers on the first insulating layer;
• forming the second insulating layer on the magnetoresistive element and the electrode layers;
• forming the second shield layer on the second insulating layer;
• and
• forming a single semiconductor layer that is made up of a single layer and disposed between one of the shield layers and the two electrode layers, for connecting both the electrode layers to the one of the shield layers.

A thin-film magnetic head comprising:

• a medium facing surface that faces toward a recording medium;
• a magnetoresistive element that detects a magnetic field from the recording medium;
• two electrode layers for feeding a current for detecting the magnetic field to the magnetoresistive element;
• a first shield layer and a second shield layer that sandwich and shield the magnetoresistive element and the electrode layers;
• a first insulating layer disposed between the magnetoresistive element/the electrode layers and the first shield layer;
• a second insulating layer disposed between the magnetoresistive element/the electrode layers and the second shield layer;
• and
• a single semiconductor layer that is made up of a single layer and disposed between one of the shield layers and the two electrode layers, for connecting both the electrode layers to the one of the shield layers.

A method of manufacturing a thin-film magnetic head comprising:

• a medium facing surface that faces toward a recording medium;
• a magnetoresistive element that detects a magnetic field from the recording medium;
• two electrode layers for feeding a current for detecting the magnetic field to the magnetoresistive element;
• a first shield layer and a second shield layer that sandwich and shield the magnetoresistive element and the electrode layers;
• a first insulating layer disposed between the magnetoresistive element/the electrode layers and the first shield layer;
• and a second insulating layer disposed between the magnetoresistive element/the electrode layers and the second shield layer, the method comprising the steps of:
• forming the first shield layer;
• forming the first insulating layer on the first shield layer;
• forming the magnetoresistive element and the electrode layers on the first insulating layer;
• forming the second insulating layer on the magnetoresistive element and the electrode layers;
• forming the second shield layer on the second insulating layer;
• and
• forming a single semiconductor layer that is made up of a single layer and disposed between one of the shield layers and the two electrode layers, for connecting both the electrode layers to the one of the shield layers.