Method and apparatus to provide embedded substrate process monitoring through consolidation of multiple process inspection techniques
AssigneeApplied Materials, Inc.
InventorReginald Hunter
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AssigneeApplied Materials, Inc.
InventorReginald Hunter
Estimating the term…
The present invention generally provides an apparatus and a method for inspecting a substrate in a processing system. More specifically, a method and apparatus providing embedded substrate monitoring through consolidation of multiple process inspection techniques in semiconductor processing equipment is disclosed. In one aspect, an optical inspection system comprising a light source and an optical receiving device, such as a CCD camera, is used to illuminate and inspect a substrate for various optical signatures. A plurality of optical inspection systems are strategically located in a cluster tool environment in order to collect optical information during processing steps. Taken together, the plurality of optical inspection systems operate as a monitoring system to determine substrate process conditions and routing.
A substrate processing system, comprising:
A method for inspecting substrates in a system comprising a front-end environment, a transfer chamber, at least one load lock connecting the front-end environment and the transfer chamber, and at least one vacuum chamber connected to the transfer chamber, the method comprising:
A method for inspecting substrates in a system comprising a front-end environment, a transfer chamber, at least one load lock connecting the front-end environment and the transfer chamber, and at least one vacuum chamber connected to the transfer chamber, the method comprising:
A substrate processing system, comprising:
Dependencies are inferred from the claim text.