# US 6,721,035 B1 · Lithographic projection apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 6,721,035 B1 - Document ID: US6721035B1 - Status: Granted - Kind: B1 - Application number: 09/552,672 - Filed: 2000-04-19 - Granted: 2004-04-13 - Earliest claimed: 1999-04-21 - Assignees: ASML Netherlands B.V. - Inventors: Hubert M. Segers; Rudolf M. Boon; Anton A. Bijnagte; Fransiscus M. Jacobs - Web page: https://patentgrep.com/patent/US6721035B1 ## CPC - G03F 7/707: {Chucks, e.g. chucking or un-chucking operations or structural details} - G03F 7/70358: {Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging} - G03F 7/70716: {Stages} - G03F 7/7075: {Handling workpieces outside exposure position, e.g. SMIF box} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A lithographic projection apparatus includes a radiation system to supply a projection beam of radiation; a mask table provided with a mask holder to hold a mask; a substrate table provided with a substrate holder to hold a substrate; a projection system to image an irradiated portion of the mask onto a target portion of the substrate; and a preparatory station comprising an intermediate table on which a substrate can be positioned before transfer to the substrate table; the intermediate table including a major surface provided with a plurality of apertures, and gas bearing generator that generates a gas bearing between the major surface and a substrate located thereon. ## Claims ### Claim 1 A lithographic projection apparatus, comprising: a radiation system constructed and arranged to supply a projection beam of radiation; a mask table provided with a mask holder constructed and arranged to hold a substrate; a substrate table provided with a substrate holder constructed and arranged to hold a substrate; a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate; a preparatory station comprising an intermediate table on which a substrate can be positioned before transfer to the substrate table, the intermediate table comprising a major surface provided with a plurality of aperatures; and a gas bearing generator constructed and arranged to generate a gas bearing between said major surface and a substrate located thereon. ### Claim 2 (depends on 1) An apparatus according to claim 1, wherein said preparatory station comprises a gas ionizer constructed and arranged to ionize said gas. ### Claim 3 (depends on 1) An apparatus according to claim 1 wherein said intermediate table comprises a first temperature controller constructed and arranged to regulate temperature of the intermediate table. ### Claim 4 (depends on 3) An apparatus according to claim 3 wherein said first temperature controller maintains the intermediate table and the gas at a temperature substantially equal to a temperature of the substrate table. ### Claim 5 (depends on 1) An apparatus according to claim 1, wherein said gas bearing has a thickness less than 150 μm. ### Claim 6 (depends on 1) An apparatus according to claim 1 wherein said preparatory station comprises a temperature controller constructed and arranged to regulate a temperature of said gas. ### Claim 7 (depends on 1) An apparatus according to claim 1 wherein said apparatus further comprises: a position detector constructed and arranged to detect a first position of said substrate on said intermediate table; a displacement calculator for calculating a required displacement between said first position and a desired position of the substrate on the intermediate table; and an actuator constructed arranged to move said substrate from said first position to said desired position. ### Claim 8 (depends on 7) An apparatus according to claim 7, wherein said position detector is constructed and arranged to detect an edge of the substrate. ### Claim 9 (depends on 7) An apparatus according to claim 7 wherein said position detector is constructed and arranged to detect a mark on the substrate. ### Claim 10 (depends on 7) An apparatus according to claim 7, wherein said gas bearing generator comprises: a gas source arranged to deliver gas through the aperatures to generate the gas bearing, and an evacuation pump arranged to evacuate the gas from the gas bearing. ### Claim 11 A device manufacturing method comprising: (a) providing a mask table with a substrate which contains a pattern, (b) providing a substrate table with a substrate which is at least partially covered by a layer of radiation-sensitive material, (c) prior to (b), providing the substrate to an intermediate table comprising a major surface provided with a plurality of aperatures, and maintaining the substrate for a given time interval upon a gas bearing generated between the major surface and the substrate; and (d) using a projection beam of radiation to project an irradiated part of the mask onto a target area of the layer of radiation-sensitive material. ### Claim 12 (depends on 11) A device manufactured in accordance with a method as claimed in claim 11. ### Claim 13 (depends on 11) A device manufacturing method according to claim 11, further comprising: ionizing said gas bearing with a gas ionizer. ### Claim 14 (depends on 11) A device manufacturing method according to claim 11, further comprising: regulating a temperature of said intermediate table with a first temperature controller. ### Claim 15 (depends on 11) A device manufacturing method according to claim 11, further comprising: regulating a temperature of said gas bearing with a second temperature controller. ### Claim 16 (depends on 11) A device manufacturing method according to claim 11, further comprising: maintaining said intermediate table and the gas bearing at a temperature substantially equal to a temperature of the substrate table. ### Claim 17 (depends on 11) A device manufacturing method according to claim 11, further comprising: detecting a first position of said substrate on said intermediate table; calculating a required displacement between said first position and a desired position of the substrate on the intermediate table; and moving said substrate from said first position to said desired position. ### Claim 18 (depends on 11) A device manufacturing method according to claim 11, further comprising: generating the gas bearing by delivering gas through said plurality of aperatures; and evacuating said gas with a gas pump. ### Claim 19 A substrate preparing device comprising an intermediate table on which a substrate can be positioned before transfer to a substrate table in a lithographic projection apparatus; the intermediate able comprising a major surface provided with a plurality of aperatures, and a gas bearing generator constructed and arranged to generate a gas bearing between said major surface and a substrate located thereon; a first temperature controller constructed and arranged to regulate a temperature of the intermediate table; and an ionizer constructed and arranged to ionize the gas. ### Claim 20 (depends on 19) A substrate preparing device according to claim 19, wherein said gas bearing generator comprises: a gas source arranged to deliver gas through the aperatures to generate the gas bearing, and an evacuation pump arranged to evacuate the gas from the gas bearing. ### Claim 21 (depends on 19) A substrate preparing device according to claim 19, wherein said first temperature controller maintains the intermediate table and the gas bearing at a temperature substantially equal to a temperature of the substrate table. ### Claim 22 (depends on 19) A substrate preparing device according to claim 19, wherein said intermediate table further comprises a second temperature controller constructed and arranged to regulate a temperature of said gas bearing. ### Claim 23 (depends on 19) A substrate preparing device according to claim 19, further comprising: a position detector constructed and arranged to detect a first position of said substrate on said intermediate table; a displacement calculator constructed and arranged to calculate a required displacement between said first position and a desired position of the substrate on the intermediate table; and an actuator constructed and arranged to move said substrate from said first position to said desired position. ### Claim 24 (depends on 19) A substrate preparing device according to claim 19, wherein said substrate preparing device is a part of a resist processing apparatus. ### Claim 25 A substrate preparing device comprising: an intermediate table on which a substrate can be positioned before transfer to a substrate table in a lithographic projection apparatus, the intermediate table comprising a major surface provided with a plurality of apertures; a gas bearing generator constructed and arranged to generate a gas bearing between said major surface and a substrate located thereon; and a temperature controller constructed and arranged to regulate a temperature of at least one of the intermediate table and the temperature of the gas. ### Claim 26 (depends on 25) A substrate preparing device according to claim 25, further comprising: a gas ionizer constructed and arranged to ionize said gas bearing. ### Claim 27 (depends on 25) A substrate preparing device according to claim 25, further comprising: a position detector constructed and arranged to detect a first position of said substrate on said intermediate table; a displacement calculator constructed and arranged to calculate a required displacement between said first position and a desired position of the substrate on the intermediate table; and an actuator constructed and arranged to move said substrate from said first position to said desired position. ### Claim 28 (depends on 25) A substrate preparing device according to claim 25, wherein said gas bearing generator comprises: a gas source arranged to deliver gas through said plurality of apertures to generate the gas bearing; and an evacuation pump arranged to evacuate the gas from the gas bearing. ### Claim 29 (depends on 25) A substrate preparing device according to claim 25, wherein said substrate preparing device is a part of a resist process apparatus.