# US 6,720,128 B2 · Positive resist composition > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 6,720,128 B2 - Document ID: US6720128B2 - Status: Granted - Kind: B2 - Application number: 10/062,497 - Filed: 2002-02-05 - Published: 2003-02-27 - Granted: 2004-04-13 - Earliest claimed: 2001-02-05 - Assignees: Fuji Photo Film Co., Ltd. - Inventors: Yutaka Adegawa; Toshiaki Aoai; Ippei Nakamura - Web page: https://patentgrep.com/patent/US6720128B2 ## CPC - G03F 7/0392: {the macromolecular compound being present in a chemically amplified positive photoresist composition} - G03F 7/0045: {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors} - G03F 7/0395: {the macromolecular compound having a backbone with alicyclic moieties} - G03F 7/0397: {the macromolecular compound having an alicyclic moiety in a side chain} - Y10S 430/106: Binder containing - Y10S 430/115: Cationic or anionic - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS ## Abstract A positive resist composition comprises: a compound capable of directly or indirectly generating a radical (A) on irradiation with an energy ray; or a cyclic ether compound. ## Claims ### Claim 1 A positive chemical amplification resist composition which comprises (a) a compound capable of directly or indirectly generating a radical (A) on irradiation with an energy ray. ### Claim 2 (depends on 1) The positive chemical amplification resist composition as claimed in claim 1, which further comprises (b) a compound capable of generating an acid on irradiation with an energy ray. ### Claim 3 (depends on 2) The positive chemical amplification resist composition as claimed in claim 2, wherein the compound (b) contains at least one compound represented by formula (II) or (III): wherein R16 to R37, which are the same or different, each represents a hydrogen atom, a straight chain, branched or cyclic alkyl group, a straight chain, branched or cyclic alkoxyl group, a hydroxyl group, a halogen atom, or an —S—R38 group; R38 represents a straight chain, branched or cyclic alkyl group, or an aryl group, and at least two of R16 to R27, and at least two of R28 to R37 may be bonded to form a ring containing at least one selected from a single bond, a carbon atom, an oxygen atom, a sulfur atom and a nitrogen atom; and X− represents an anion of a sulfonic acid. ### Claim 4 (depends on 3) The positive chemical amplification resist composition as claimed in claim 3, wherein X− represents an anion of an alkylsulfonic acid, a benzenesulfonic acid, a naphthalenesulfonic acid or an anthracenesulfonic acid, each of which has at least one group selected from the group consisting of: at least one fluorine atom; a straight chain, branched, or cyclic alkyl group substituted with at least one fluorine atom; a straight chain, branched, or cyclic alkoxyl group substituted with at least one fluorine atom; an acyl group substituted with at least one fluorine atom; an acyloxy group substituted with at least one fluorine atom; a sulfonyl group substituted with at least one fluorine atom; a sulfonyloxy group substituted with at least one fluorine atom; a sulfonylamino group substituted with at least one fluorine atom; an aryl group substituted with at least one fluorine atom; an aralkyl group substituted with at least one fluorine atom; and an alkoxycarbonyl group substituted with at least one fluorine atom. ### Claim 5 (depends on 1) The positive chemical amplification resist composition as claimed in claim 1, which further comprises at least one of: (e) a resin: containing an acid-decomposable group; and being capable of increasing the solubility in an alkali developer by the action of an acid; and (g) a resin insoluble in water and soluble in an alkali developer. ### Claim 6 (depends on 1) The positive chemical amplification resist composition as claimed in claim 1, which further comprises (f) a low molecular weight dissolution-inhibiting compound: having a molecular weight of 3,000 or less; containing an acid-decomposable group; and being capable of increasing the solubility in an alkali developer by the action of an acid. ### Claim 7 (depends on 1) The positive chemical amplification resist composition as claimed in claim 1, wherein the radical (A) is capable of generating an acid by a reaction with the compound (a). ### Claim 8 (depends on 1) The positive chemical amplification resist composition as claimed in claim 1, wherein the compound (a) is at least one compound selected from the group consisting of: (1) an alkyl halide other than an alkyl fluoride, an aryl halide other than an aryl fluorine, an aralkyl halide other than an aralkyl fluorine, and an allyl halide other than an allyl fluorine, in which a part or all of the hydrogens in the alkyl halide, the aryl halide, the aralkyl halide and the allyl halide may be substituted with a fluorine, (2) a thiol compound, a secondary alcohol, a substituted or unsubstituted allyl alcohol, a benzyl alcohol which may be a substituent on the aromatic ring, ester and ether compounds of them, a sulfide compound, and a disulfide compound, (3) a halogen-containing silicon compound and an alkoxy silicon compound, (4) a straight chain, branched or cyclic acetal compound, and (5) an N-hydroxyl compound. ### Claim 9 (depends on 1) The positive chemical amplification resist composition as claimed in claim 1, which further comprises (c) an organic basic compound. ### Claim 10 (depends on 1) The positive chemical amplification resist composition as claimed in claim 1, which further comprises (d) a surfactant containing at least one of a fluorine atom and a silicon atom. ### Claim 11 (depends on 1) The positive chemical amplification resist composition as claimed in claim 1, which further comprises propylene glycol monomethyl ether acetate as a solvent. ### Claim 12 (depends on 1) The positive chemical amplification resist composition as claimed in claim 1, wherein the energy ray is one of an electron beam and an X-ray.