Method of fabricating high-dielectric color filter

A color filter fabricating method, comprising the steps of:

• placing a color filter forming substrate formed by arraying thin film transistors and transparent conductive films on a transparent substrate and providing thin semiconductor films on the conductive films so that at least the thin semiconductor films of the color filter forming substrate contact an aqueous electrodeposition liquid which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH;
• in this state, irradiating a thin semiconductor film of a selected region with light to apply a voltage between the thin semiconductor film and an opposing electrode;
• and
• depositing a high-dielectric colored film in the thin semiconductor film of the selected region.

A color filter fabricating method, comprising the steps of:

• placing a color filter forming substrate formed by providing a transparent conductive thin film and a transparent thin semiconductor film in contact with the conductive film on a transparent substrate, the conductive film being conductible to an electrolyte so that the thin semiconductor film contacts an aqueous electrolyte which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH;
• bringing the conductive film into conduction with the electrolyte;
• in this state, irradiating a selected region of the thin semiconductor film with light;
• and
• depositing a high-dielectric colored film in the thin semiconductor film of the selected region.

A color filter fabricating method, comprising the steps of:

• placing a color filter forming substrate formed by arraying thin film transistors and transparent conductive films on a transparent substrate and providing transparent thin semiconductor films in contact with the conductive films so that a part of the conductive film is exposed so that at least the conductive films and the thin semiconductor films contact an aqueous electrolyte which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH;
• irradiating the thin semiconductor film of a selected region with light;
• and
• depositing a high-dielectric colored film in the thin semiconductor film of the selected region.

A color filter fabricating method, comprising the steps of:

• placing a color filter forming substrate formed by arraying thin film transistors and transparent conductive films on a transparent substrate and transparent thin semiconductor films in contact with the conductive films so that a part of the conductive films is exposed so that at least the conductive films and the thin semiconductor films contact an aqueous electrolyte which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH;
• selectively driving a predetermined thin film transistor;
• in this state, irradiating the entire surface of the color filter forming substrate with light;
• and
• depositing a high-dielectric colored film in a thin semiconductor film corresponding to a thin film transistor not driven.