Versatile wafer refining
AssigneeBeaver Creek Concepts Inc
InventorCharles J. Molnar
Life of this patent
Estimating the term…
Loading patent…
AssigneeBeaver Creek Concepts Inc
InventorCharles J. Molnar
Estimating the term…
A refining apparatus having magnetically responsive refining elements that can be smaller than the workpiece being refined are disclosed. The refining apparatus can supply a parallel refining motion to the refining element(s) through magnetic coupling forces. The refining apparatus can supply multiple different parallel refining motions to multiple different refining elements solely through magnetic coupling forces to improve refining quality and versatility. New refining methods, refining apparatus, and refining elements disclosed. Methods of refining using frictional refining, chemical refining, tribocbemical refining, and electrochemical refining and combinations thereof are disclosed. A refining chamber can be used. New methods of control are refining disclosed. The new magnetic refining methods, apparatus, and magnetically responsive refining elements can help improve yield and lower the cost of manufacture for refining of workpieces having extremely close tolerances such as semiconductor wafers. Refining fluids are preferred. Reactive refining aids are preferred. Electro-refining for adding and removing material is disclosed. New methods and new apparatus for non-steady state refining control are disclosed.
A method for refining a semiconductor wafer having a semiconductor wafer surface comprising the steps of:
A method for refining a semiconductor wafer having a semiconductor wafer surface comprising the steps of:
An apparatus for refining a workpiece surface comprising:
A magnetic refining element comprising:
A magnetic refining element comprising:
Dependencies are inferred from the claim text.