Azo dyes and azo-metal complexes for atomic force microscope lithography
AssigneeHanyang Hakwon Co., Ltd.
InventorsHaiwon Lee, Hyeyoung Park
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Abstract
This invention relates to nano-lithography with π-conjugated azo dyes and azo-metal complexes represented by formula 1 or formula 2(Korea Pat. Appln. Nos. 2001-6879˜6880), which has both electron-donating and electron-accepting groups in the molecular structures, as a resist on Si substrate by using an AFM anodization. lithography. Developing optimum conditions of scan speed, bias voltage, and resist materials are key issues for achieving a high resolution patterning on various substrates. We accomplished nanometer-scale patterning in approximately 35 nm dimensions.
Claims7
Azo dyes or azo-metal complexes for AFM lithography represented by the following formula 1
- wherein R1, R2, R3, R4 and R5 are independently a hydrogen atom, a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, a carboxyl group, a nitro group, a hydroxy group, a cyano group, a phenyl group or a sulfonic acid group;
- and R4 and R5 may form a benzene ring, a naphthalene ring or an anthracene ring.
Azo dyes or azo-metal complexes for AFM lithography, which are expressed by formula 2
- wherein Z1 and Z2 are S, N or O;
- and R6, R7, R8 and R9 are independently a hydrogen atom, a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, a carboxyl group, a nitro group, a hydroxy group, a cyano group, a phenyl group or a sulfonic acid group.
AFM lithography method performed at 7-15V of voltage, 40-70% of humidity and 1-100 μm/s of speed for resist composition, comprising azo compounds or azo-metal complexes represented by the following formula 1 or formula 2, spin-coated on metal and semiconductor substrates.
- wherein R1,/R2, R3, R4 and R5 are independently a hydrogen atom, a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, a carboxyl group, a nitro group, a hydroxy group, a cyano group, a phenyl group or a sulfonic acid group;
- and R4 and R5 may form a benzene ring, a naphthalene ring or an anthracene ring;
- and
- wherein Z1 and Z2 are S, N or O;
- and R6, R7, R8 and R9 are independently a hydrogen atom, a halogen atom, a C1-C6 alkyl group, a C1-C6 alkoxy group, a carboxyl group, a nitro group, a hydroxy group, a cyano group, a phenyl group or a sulfonic acid group.
Dependencies are inferred from the claim text.