Loading patent…
AssigneeMotorola, Inc.
InventorRobert Lempkowski
Estimating the term…
Polarization modulator devices can be formed to take advantage of multi-layered semiconductor structures. High quality epitaxial layers of monocrystalline materials can be grown overlying monocrystalline substrates such as large silicon wafers by forming a compliant substrate for growing the monocrystalline layers. An accommodating buffer layer comprises a layer of monocrystalline oxide spaced apart from a silicon wafer by an amorphous interface layer of silicon oxide. The amorphous interface layer dissipates strain and permits the growth of a high quality monocrystalline oxide accommodating buffer layer. The accommodating buffer layer is lattice matched to both the underlying silicon wafer and the overlying monocrystalline material layer. Any lattice mismatch between the accommodating buffer layer and the underlying silicon substrate is taken care of by the amorphous interface layer.
A system for polarization modulation of an RF or optical signal for transmission comprising:
A system for polarization modulation for reception of a first orthogonal antenna signal and a second orthogonal antenna signal comprising:
Dependencies are inferred from the claim text.