De broglie microscope
AssigneeAdvanced Micro Devices, Inc.
InventorsMichael R. Bruce, Victoria Jean Bruce, Rama R. Goruganthu
Life of this patent
Estimating the term…
Abstract
Methods and apparatus for inspecting a sample are provided. In one aspect, a method of inspection is provided that includes generating an entangled set of particle beams and directing one of the entangled set of particle beams to a location of a workpiece. One of the entangled set of particle beams interacts with the location of the workpiece. One of the entangled set of particle beams is observed after the interaction with the location of the workpiece to inspect the location of the workpiece.
Claims49
A method of inspection, comprising:
- generating an entangled set of particle beams;
- directing one of the entangled set of particle beams to a location of a workpiece, the one of the entangled set of particle beams interacting with the location of the workpiece;
- and
- observing one of the entangled set of particle beams after the interaction with the location of the workpiece to inspect the location of the workpiece.
A method of inspection, comprising:
- generating a plurality of pairs of entangled photons, the plurality of pairs of entangled photons being divided into a first beam and a second beam;
- directing one of the first and second beams to a location of a workpiece, the one of the first and second beams interacting with the location of the workpiece;
- and observing one of first and second beams after the interaction with the location of the workpiece to inspect the location of the workpiece.
An inspection device, comprising:
- a radiation source capable of transmitting an incident beam;
- a non-linear member for producing a set of entangled beams from the incident beam;
- an imaging device for observing an interaction of one of the set of entangled beams with a location of a workpiece.
An inspection device, comprising:
- a radiation source capable of transmitting an incident beam;
- a non-linear crystal for producing a plurality of pairs of entangled photons from the incident beam, the plurality of pairs of entangled photons being divided into a first beam and a second beam;
- and
- an imaging device for observing an interaction of one of the first and second beams with a location of a semiconductor workpiece.
Dependencies are inferred from the claim text.