Projection optical system, projection exposure apparatus, and projection exposure method

An exposure apparatus transferring onto a substrate an image of a pattern on a mask, the apparatus comprising:

• a light source having a natural linewidth;
• a linewidth narrowing unit in the light source receiving the radiation having the natural linewidth and emitting radiation for exposure having a linewidth narrower than the natural linewidth;
• an illumination optical system receiving the radiation from the light source and guiding the received radiation to the mask;
• and
• a projection optical system forming on the substrate an image of the pattern on the mask in correspondence to radiation received from the mask, the projection optical system comprising one or more refractive optical members collectively comprising at least two fluoride substances, wherein
• the at least two fluoride substances comprise a first fluoride substance and a second fluoride substance, and
• each f-number FN1 of the one or more refractive optical members comprising the second flouride substance satisfies a design condition of 0.8<|FNi |.

An exposure apparatus transferring onto a substrate an image of a pattern on a mask, the apparatus comprising:

• a light source having a natural linewidth;
• a linewidth narrowing unit in the light source receiving the radiation having the natural linewidth and emitting radiation for exposure having a linewidth narrower than the natural linewidth;
• an illumination optical system receiving at least some of the radiation from the light source and guiding at least some of the received radiation to the mask;
• and
• a projection optical system forming on the substrate an image of the pattern on the mask in correspondence to radiation received from the mask, wherein
• the projection optical system comprises one or more refractive optical members collectively comprising at least two fluoride substances, wherein
• the at least two fluoride substances collectively comprise a first fluoride substance and a second fluoride substance with MX1 being greater than MX2,
• a design condition 0.4 < MX 2 MX 1 < 0.87
• is satisfied,
• MX1 is the effective aperture of the surface or surfaces having the largest effective aperture among the surface or surfaces of the refractive optical member or members comprising the first fluoride substance, and
• MX2 is the effective aperture of the surface or surfaces having the largest effective aperture among the surface or surfaces of the refractive optical member or members comprising the second fluoride substance.

An exposure apparatus transferring onto a substrate an image of a pattern on a mask, the apparatus comprising:

• a light source having a natural linewidth;
• a linewidth narrowing unit in the light source receiving the radiation having the natural linewidth and emitting radiation for exposure having a linewidth narrower than the natural linewidth;
• an illumination optical system receiving at least some of the radiation from the light source and guiding at least some of the received radiation to the mask;
• and
• a projection optical system forming on the substrate an image of the pattern on the mask in correspondence to radiation received from the mask, wherein
• the projection optical system comprises one or more refractive optical members collectively comprising at least two fluoride substances,
• each of the refractive optical members within the projection optical system respectively comprises one or more fluoride substances,
• the at least two fluoride substances collectively include calcium fluoride and barium flouride,
• the at least two fluoride substances collectively include a first fluoride substance and a second fluoride substance
• MX1 is the effective aperture of the surface or surfaces having the largest effective aperture among the surface or surfaces of the refractive optical member or members comprising the first fluoride substance,
• MX2 is the effective aperture of the surface or surfaces having the largest effective aperture among the surface or surfaces of the refractive optical member or members comprising the second fluoride substance,
• MX1 being greater than MX2, and
• a design condition 0.4 < MX 2 MX 1 < 0.87
• is satisfied.