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US 6,714,278 B2Granted
Exposure apparatus
AssigneeNikon Corporation
InventorSaburo Kamiya
Life of this patent
Estimating the term…
Abstract
An exposure apparatus for transferring a pattern on a reticle, through a projection optical system, onto a wafer having a photosensitive material coated thereon. The exposure apparatus includes a vacuum heat insulation panel which is applied to at least a part of the structure of the exposure apparatus so as to improve performance of temperature-control in the exposure apparatus.
Claims4
An exposure apparatus comprising:
- an exposure machine main portion which transfers a pattern on a mask onto a substrate through a projection optical system;
- an environment chamber which encloses all of the exposure machine main portion and is maintained at a predetermined temperature;
- and
- a vacuum heat insulation panel which comprises a filler, an envelope enclosing the filler therein in a vacuum condition, and a heat-sealing layer laminated on the envelope to enclose the envelope and the filler, and which is fixed on the side wall a lens barrel of the projection optical system,
- wherein the vacuum heat insulation panel prevents an occurrence of a thermal expansion of the lens barrel.
2 more elements
An exposure apparatus comprising:
- an exposure machine main portion which transfers a pattern on a mask onto a substrate;
- an environment chamber which encloses all of the exposure machine main portion and is maintained at a predetermined temperature;
- circuit boards which are connected to the chamber, and which control the exposure machine main portion;
- and
- a vacuum heat insulation panel which comprises a filler, an envelope enclosing the filler therein in a vacuum condition, a heat-sealing layer laminated on the envelope to enclose the envelope and the filler, and a pair of metal sheets sandwiching the envelope, the filler, and the heat-sealing layer,
- wherein the vacuum heat insulation panel composes a wall disposed between the exposure machine main portion and the circuit boards, and
- wherein the vacuum heat insulation panel prevents an occurrence of a temperature gradient in the environment chamber by transferring heat generated in the circuit boards.
4 more elements
An exposure apparatus comprising:
- an exposure machine main portion which transfers a pattern on a mask onto a substrate;
- an environment chamber having an inner wall and an outer wall which encloses all of the exposure machine main portion and is maintained at a predetermined temperature;
- and
- a vacuum heat insulation panel which comprises a filler, an envelope enclosing the filler therein in a vacuum condition, and a heat-sealing layer laminated on the envelope to enclose the envelope and the filler, and which is sandwiched between the inner wall and the outer wall,
- wherein the vacuum heat insulation panel prevents an occurrence of a temperature gradient in the environment chamber by transferring heat generated outside of the environment chamber.
2 more elements
An exposure apparatus comprising:
- an exposure machine main portion which transfers a pattern on a mask onto a substrate;
- an environment chamber which encloses all of the exposure machine main portion and is maintained at a predetermined temperature;
- and
- a vacuum heat insulation panel which comprises a filler, an envelope enclosing the filler therein in a vacuum condition, a heat-sealing layer laminated on the envelope to enclose the envelope and the filler, and a pair of metal sheets sandwiching the envelope, the filler, and the heat-sealing layer;
- wherein the vacuum heat insulation panel composes a wall, said wall defining a space to which local precision temperature-control is effected in the environment chamber, and
- wherein the vacuum heat insulation panel prevents an occurrence of a temperature gradient in the space by transferring heat generated outside of the space.
3 more elements
Dependencies are inferred from the claim text.