Method of fabricating thin film bulk acoustic resonator (FBAR) and FBAR structure embodying the method
AssigneeAgilent Technologies, Inc.
InventorsRichard C. Ruby, Paul Bradley, Yury Oshmyansky, Domingo A. Figueredo
Life of this patent
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Abstract
A method for fabricating an acoustic resonator, for example a Thin Film Bulk Acoustic Resonators (FBAR), on a substrate. A depression is etched and filled with sacrificial material. The FBAR is fabricated on the substrate spanning the depression, the FBAR having an etch hole. The depression may include etch channels in which case the FBAR may include etch holes aligned with the etch channels. A resonator resulting from the application of the technique is suspended in air and includes at least one etch hole and may include etch channels.
Claims16
An apparatus comprising:
- a substrate having a depression on a top surface, the depression defining at least one etch channel;
- and
- an acoustic resonator fabricated on the substrate and spanning the depression, the acoustic resonator having an etch hole providing access to the depression.
An apparatus comprising:
- a substrate having a depression on a top surface;
- an acoustic resonator fabricated on the substrate and spanning the depression, the acoustic resonator having an etch hole providing access to the depression and wherein the depression defines an area on the top surface of the substrate and the etch hole is at substantially center of the area;
- and
- wherein in the area is shaped as a polygon and the apparatus further comprising additional etch holes, one etch hole at selected vertices of the polygon area.
A method of fabricating an acoustic resonator on a substrate having a top surface, said method comprising steps of:
- etching a depression in said top surface, the depression defining having etch channels;
- filling said depression with a sacrificial material;
- fabricating the acoustic resonator on the substrate, the acoustic resonator having an etch hole;
- and
- removing the sacrificial material.
A method of fabricating an acoustic resonator on a substrate having a top surface, said method comprising steps of:
- etching a depression in said top surface;
- filling said depression with a sacrificial material;
- fabricating the acoustic resonator on the substrate, the acoustic resonator having an etch hole;
- removing the sacrificial material;
- and
- wherein the depression defines an area on the top surface of the substrate and the etch hole is at substantially center of the area and wherein the area has a polygon shape and the apparatus further comprising additional etch holes, one etch hole at each of selected vertices of the polygon area.
An apparatus comprising:
- a substrate having a depression on a top surface, the depression having defining etch channels;
- and
- an acoustic resonator fabricated on the substrate and over the depression, said acoustic resonator having etch holes aligned with the etch channels of said substrate.
A method of fabricating an acoustic resonator on a substrate having a top surface, said method comprising steps of:
- etching a depression in the top surface, the depression defining having at least one etch channel;
- filling the depression with a sacrificial material;
- fabricating the acoustic resonator on the substrate, the resonator defining at least one etch hole;
- and
- removing the sacrificial material through the etch hole.
Dependencies are inferred from the claim text.