Plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsNobuo Ishii, Yasuyoshi Yasaka
Life of this patent
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Abstract
A plasma processing apparatus has a process container, a carriage housed in the process container and having a surface for carrying an object to be processed, and a slot antenna disposed to oppose the carrying surface of the carriage and having a radiation plane formed with a plurality of slots so as to radiate electromagnetic fields to the inside of the process container through the plurality of slots. The slot antenna radiates the electromagnetic fields in a direction oblique to the normal direction of the radiation plane.
Claims19
A plasma processing apparatus comprising a process container, a carriage housed in said process container and having a surface for carrying an object to be processed, and a slot antenna disposed to oppose the carrying surface of said carriage and having a radiation plane formed with a plurality of slots so as to radiate electromagnetic fields to the inside of said process container through the plurality of slots, wherein said slot antenna radiates the electromagnetic fields in a direction oblique to the normal direction of said radiation plane.
Dependencies are inferred from the claim text.