Image detection device
AssigneeKabushiki Kaisha Toshiba
InventorsJunsei Tsutsumi, Akira Kinno, Mitsushi Ikeda
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AssigneeKabushiki Kaisha Toshiba
InventorsJunsei Tsutsumi, Akira Kinno, Mitsushi Ikeda
Estimating the term…
An image detection device includes a pixel portion (OEF) having a photoelectric conversion film for converting incident light into a signal charge and a pixel capacitor for accumulating the signal charge, and a thin film transistor (TFT1) included in a signal detective circuit operation of which is controlled by a scanning line (G1) to read out the potential of a pixel electrode to a signal line (S1). The transistor (TFT1) having a source or drain connected to the pixel electrode is a TFT having an LDD structure on a high-potential side, a TFT having LDD structures on the high- and low-potential sides in which the LDD length is larger on the high-potential side, or a TFT having a double-gate structure. When the image detection device includes a protective diode (TFT2) for, if the potential of the pixel electrode reaches a predetermined value or more, flowing pixel charges to a bias line (B1) to prevent destruction of the pixel electrode, the transistor (TFT2) has an LDD structure on at least a high-potential side or a double-gate structure. This arrangement can increase the OFF resistance to suppress the leakage current, and can prevent a decrease in S/N ratio owing to leakage of signal charges before a read.
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Dependencies are inferred from the claim text.