Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKatsuhiro Kobayashi, Youichi Ohsawa, Koji Hasegawa, Takao Yoshihara, Kazunori Maeda, Toshihiko Fujii
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Abstract
Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development.
Claims15
A sulfonyldiazomethane compound having the following general formula (1):
- wherein R1 is independently hydrogen or a substituted or unsubstituted, straight, branched or cyclic alkyl or alkoxy group of 1 to 4 carbon atoms, G is SO2 or CO, R2 is a substituted or unsubstituted, straight, branched or cyclic alkyl group of 1 to 10 carbon atoms or a substituted or unsubstituted aryl group of 6 to 14 carbon atoms, p is 1 or 2, q is 0 or 1, satisfying p+q=2, m is an integer of 2 to 11, n is an integer of 0 to 3, and k is an integer of 0 to 6.
A sulfonyldiazomethane compound having the following general formula (1′):
- wherein R1 is independently hydrogen or a substituted or unsubstituted, straight, branched or cyclic alkyl or alkoxy group of 1 to 4 carbon atoms, m is an integer of 2 to 11, n is an integer of 0 to 3, and k is an integer of 0 to 6.
Dependencies are inferred from the claim text.