Developing method and developing apparatus
AssigneeTokyo Electron Limited
InventorsTakayuki Toshima, Tsutae Omori, Yoshio Kimura
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Abstract
A solution having a photosensitive radical is applied onto a resist film, a developing solution is applied thereonto, and the entire surface of the solution having the photosensitive radical is exposed all at once. Developing of the resist film progresses all at once after a coating film of the solution having the photosensitive radical dissolves in the developing solution, and hence time difference in the start time of developing does not occur in the surface of a substrate, thereby enabling uniform developing and an improvement in line width uniformity (CD value uniformity) in the surface of the substrate.
Claims10
A developing method for exposing a resist film formed on a substrate in a predetermined pattern and thereafter developing the exposed pattern, comprising the steps of:
- (a) exposing the resist film formed on the substrate in the predetermined pattern:
- (b) post-exposure baking the substrate:
- (c) applying a solution having a photosensitive radical onto the entire upper surface of the resist film on the substrate;
- (d) applying a developing solution onto the entire upper surface of the applied solution;
- and
- (e) exposing the entire surface of the solution having the photosensitive radical applied onto the resist film via the developing solution.
A developing method for exposing a resist film formed on a substrate in a predetermined pattern and thereafter developing the exposed pattern, comprising the steps of:
- (a) exposing the resist film formed on the substrate in the predetermined pattern;
- (b) post-exposure baking the substrate;
- (c) applying a solution having a photosensitive radical onto the entire upper surface of the resist film on the substrate;
- (d) applying a developing solution onto the entire upper surface of the applied solution;
- and
- (e) exposing the entire surface of the solution having the photosensitive radical applied onto the resist film via the developing solution and developing the resist film by the developing solution and the dissolved solution.
Dependencies are inferred from the claim text.