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US 6,713,238 B1Granted
Microscale patterning and articles formed thereby
OwnerStephen Y. Chou, Lei Zhuanginventors
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Abstract
The formation of self-assembled patterns in a substrate through deformation induce by a mask placed above the substrate are disclosed. Methods of the present invention may be used to form arrays of nanometer sized pillars as well as mesas from a thin deformable layer of the substrate or a thin film of material deposited on the substrate.
Claims22
A method of forming a pattern on a surface comprising:
- placing a mask above a substrate having a surface layer that is deformable;
- maintaining the mask at a substantially constant distance above the substrate;
- and
- allowing self-assembly of a pattern between the mask and the surface layer of the substrate, said step of allowing self-assembly of a pattern including rendering the surface layer of the substrate deformable.
1 more element
A method of forming a pattern on a surface comprising:
- placing a mask above a substrate having a surface layer material that is deformable, said surface layer material being selected from the group consisting of a homopolymer, a copolymer, a polymer blend, a liquid, a liquid polymer, liquid crystals, a semiconductor, a metal, and a dielectric material;
- maintaining a separation between said mask and the substrate at a constant distance;
- allowing self-assembly of a pattern between said mask and said surface layer.
A method of forming a pattern on a surface, comprising the steps of:
- obtaining a substrate;
- depositing a polymer film on the substrate;
- placing a mask above the polymer film on the substrate, said mask having a protruding feature;
- and
- maintaining a mask substrate separation constant and heating the polymer film to thereby form a contact between said film and said protruding feature to self-assemble a pattern between the polymer film and the protruding feature of said mask.
2 more elements
Dependencies are inferred from the claim text.