Terpolymer for amplified resist
AssigneeSamsung Electronics Co., Ltd.
InventorsSang-jun Choi, Chun-geun Park, Young-bum Koh
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AssigneeSamsung Electronics Co., Ltd.
InventorsSang-jun Choi, Chun-geun Park, Young-bum Koh
Estimating the term…
Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.
A terpolymer for use in a chemically amplified resist, the terpolymer having the following formula:
A terpolymer for use in a chemically amplified resist, the terpolymer having the formula:
A terpolymer for use in a chemically amplified resist, the terpolymer having the formula:
A terpolymer for use in a chemically amplified resist, the terpolymer having the formula:
A terpolymer for use in a chemically amplified resist, the terpolymer having the formula:
A terpolymer for use in a chemically amplified resist, the terpolymer having the formula:
A terpolymer for use in a chemically amplified resist, the terpolymer having the formula:
A terpolymer for use in a chemically amplified resist, the terpolymer having the formula:
Dependencies are inferred from the claim text.