Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same
AssigneeSamsung Electronics Co., Ltd.
InventorsHyun-Woo Kim, Sang-Gyun Woo, Sung-Ho Lee
Life of this patent
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Abstract
Provided are alkenyl ether-based monomers having multi-ring structure, and photosensitive polymers and resist compositions obtained from the same. The photosensitive polymer includes a monomer unit represented by the following formula: wherein R4 and R5 are independently -H or -CH3, and R4 are independently -H, -OH or a alkyl group having 1-20 carbon atoms.
Claims61
A monomer having a structure represented by the following formula:
- wherein R1 is -H or -CH3, R2 and R3 is selected from the group consisting of -H, -OH, an alkyl group having 1-20 carbon atoms, hydroxyalkyl, alkyloxy, carboxyl, carbonyl, ester and fluorinated alkyloxy.
A photosensitive polymer comprising a monomer unit represented by the following formula:
- wherein R4 and R5 are -H or -CH3, and R6 and R7 is selected from the group consisting of -H, -OH, an alkyl group having 1-20 carbon atoms, hydroxyalkyl, alkyloxy, carboxyl, carbonyl, ester and fluorinated alkyloxy.
A photosensitive polymer having a structure represented by the following formula:
- wherein R4, R5, R11 and R12 are -H or -CH3, R6, R7, R13 and R14 is selected from the group consisting of -H, -OH, alkyl group having 1-30 carbon atoms hydroxyalkyl, alkyloxy, carboxyl, carbonyl, ester and fluorinated alkyloxy, at least one of R6, R7, R13 and R14 is an acid-labile group, and m/(m+n) is from about 0.1 to 0.9.
A photosensitive polymer comprising a polymerized product of (a) at least one monomer unit having a structure represented by the following formula:
- wherein R4 and R5 are -H or -CH3, R6 and R7 is selected from the group consisting of -H, -OH, an alkyl group having 1-20 carbon atoms, hydroxyalkyl, alkyloxy, carboxyl, carbonyl, ester and fluoinated alkyloxy, and (b) at least one comonomer selected from the group consisting of a maleic anhydride monomer, an acrylate monomer, a methacrylate monomer, a norbomene monomer, a dihydrofliran monomer and a dihydropyran monomer.
A resist composition comprising:
- (a) a photosensitive polymer having a structure represented by the following formula:
- wherein R4 and R5 are -H or -CH3, and R6 and R7 is selected from the group consisting of -H, -OH, an alkyl group having from 1-20 carbon atoms;
- and
- (b) a photoacid generator (PAG).
A resist composition comprising:
- (a) a photosensitive polymer comprising a polymerized product of (i) at least one monomer unit having a structure represented by the following formula:
- wherein R4 and R5 are -H or -CH3, R and R7 are -H, -OH or an alkyl group having 1-20 carbon atoms, and (ii) at least one comonomer selected from the group consisting of a maleic anhydride monomer, an acrylate monomer, a methacrylate monomer, a norbomene monomer, and dihydrofuiran or dihydropyran monomer;
- and
- (b) a PAG.
Dependencies are inferred from the claim text.