Method of removing contamination adhered to surfaces and apparatus used therefor
AssigneeNomura Micro Science Co., Ltd.
InventorHisashi Muraoka
Life of this patent
Estimating the term…
Abstract
A method of removing surface-deposited contaminants, comprising bringing an ozone-containing treating solution into contact with the surface of a treating target on which contaminants have deposited. The ozone-containing treating solution comprises an organic solvent having a partition coefficient to ozone in a gas, of 0.6 or more, and ozone having been dissolved in the solvent. Contaminants having deposited on the surfaces of various articles including substrates for electronic devices, such as semiconductor substrates and substrates for liquid crystal display devices can be removed by room-temperature and short-time treatment in a high safety and a good efficiency.
Claims7
A method of removing organic contaminants deposited on a surface of a substrate of an electronic device, comprising bringing a treating solution into contact with said surface, wherein
- said treating solution comprises:
- a solvent having a concentration of at least 70% by volume of acetic acid and the remaining balance of water, and
- at least 100 ppm of ozone dissolved in said solvent.
Dependencies are inferred from the claim text.