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US 6,688,956 B1Granted
Substrate polishing device and method
AssigneePsiloQuest, Inc.
InventorsEdward M. Yokley, Yaw S. Obeng
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Abstract
To address the deficiencies of the prior art, the present invention provides a polishing pad comprising a thermoplastic polymer and a method of manufacturing therefor. More specifically, the present invention polishing pad fabricated from an extruded amorphous thermoplastic and free of a gate vestige. The invention also provides a method of manufacturing a polishing pad that is free from a gate vestige pad from an extruded amorphous thermoplastic.
Claims8
A polishing pad, comprising:
- an extruded thermoplastic material selected from the class of amorphous thermoplastics selected from the group consisting of:
- aliphatic polyketones,
- aromatic polyketones and
- aromatic polysulfones;
- and
- wherein the polishing pad is free of a gate vestige.
3 more elements
Dependencies are inferred from the claim text.