Process monitoring system for lithography lasers

A system for monitoring lithography lasers at at least one integrated circuit fabrication plant, said system, comprising:

• A) a plurality of lasers each being configured for use as illumination sources in an integrated circuit lithography process,
• B) a terminal server associated with each one of said plurality of lasers;
• C) a central fabrication plant server unit in communication through a local area network with each of said plurality of lasers;
• said central fabrication plant unit being programmed to acquire data from each of said lasers and to store at least portions of the data in raw form and/or summary form;
• D) a second server unit providing communication through a communication network between said first server unit and computers utilized by persons having access authorization to the information stored by said first server unit.