US 6,686,599 B2 · Ion production device for ion beam irradiation apparatus

Abstract

An ion beam irradiation apparatus is provided with a plasma production device 30 which produces a plasma 12 through the radio frequency discharge and supplies the produced plasma in the vicinity of the substrate 4. The plasma production device 30 includes a plasma producing chamber 32 being elongated along an axis 33 extending in scanning directions X in which the ion beam is moved; a plasma emission hole 34 being provided in a side thereof and elongated along the axis 33 of the plasma producing chamber; and a magnet 36 provided outside the plasma producing chamber 32 for producing a magnetic field having a direction along the axis 33. The magnetic field developed by the magnet 36 contains a magnetic field which has a direction along the axis and bends to the substrate ions contained in the plasma 12 emitted from a plasma emission hole 34.

Claims21

Dependent claims

A plasma production device for an ion beam irradiation apparatus which irradiates to a substrate an ion beam, the plasma production device comprising:

a plasma production chamber being elongated along an axis extending in a scanning direction, the plasma production chamber for producing a plasma by the radio frequency discharge, the plasma production chamber having a plasma emission hole defined along the axis;
and
a first magnet disposed outside the plasma production chamber for producing a first magnet field directed along the axis,
wherein the magnet field bends charged particles in the plasma toward substrate and suppresses a charge-up of the substrate.

1 more element

An ion irradiating apparatus for irradiating to substrate an ion beam, the ion irradiating apparatus comprising:

a plasma production device for producing a plasma by a radio frequency discharge, the plasma production device having
a plasma production chamber being elongated along an axis extending in a scanning direction, the plasma production chamber for producing a plasma by the radio frequency discharge, the plasma production chamber having a plasma emission hole defined along the axis, and
a first magnet disposed outside the plasma production chamber for producing a magnetic field directed along the axis, so that the magnetic field bends charged particles in the plasma toward the substrate and suppresses a charge-up of the substrate, the first magnet is a permanent magnet movable in a direction to which a distance from the first magnet to the plasma emission hole is varied;
a vacuum chamber for irradiating to a substrate ion beam derived from an ion source, the vacuum chamber having,
a holder for holding the substrate, and
a holder driving device for driving the holder;
and
an insulating material interposed between the plasma production device and the vacuum chamber.

5 more elements

Dependencies are inferred from the claim text.

Ion production device for ion beam irradiation apparatus

Life of this patent

Ion production device for ion beam irradiation apparatus

Life of this patent

Abstract

Claims21